Modification of thin layers of specific materials

The chemical modification of materials under exposure to high-energy electrons is relevant to different technical processes (f.e. lithography, treatment of polymers). We investigate how the higher selectivity of low-energy electrons can be exploited to modify thin layers of materials in a more controlled manner by performing electron exposure experiments at different electron energies.

Currently the following material systems are studied:

• Siloxanes and polysiloxanes for functional surface coatings. The crosslinking resulting from electron exposure and from plasma treatment are compared.

• Polysaccharides as green materials for thin coatings. The properties of such coatings such as their wetting behaviour can be modified by low-energy electron exposure.

• Metal organic precursors for electron beam induced deposition (EBID). A better understanding of the reaction mechanisms is expected to lead to improvements in the technical processes.

More information:

Low-energy electron-induced chemistry of condensed-phase hexamethyldisiloxane: Initiating dissociative process and subsequent reactions;
I. Ipolyi, E.Burean, T.Hamann, M.Cingel, S.Matejcik, P. Swiderek,
Int.J.Mass Spectrom. 282, 133 (2009).

Electron-induced reactions of MeCpPtMe3 investigated by HREELS;
M.N.Hedhili, J.H.Bredehöft, P.Swiderek;
J. Phys. Chem. C, 113, 13282 (2009).

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